发明名称 Particle inspection device and inspection method using the same
摘要 A multi-use holder of a particle inspection device and an inspection method using the same can inspect both a wafer and a photomask using a scattering type inspection device since the scattering of a laser light irradiated from a light source can be avoided by fabricating the multi-use holder in a wafer shape, providing a second mounting portion and a first mounting portion on the upper surface thereof and forming a coating portion on the upper surface of the multi-use holder thereon when disposing the multi-use holder on a chuck fixed to a supporter by a vacuum generator, thereby reducing costs and improving productivity.
申请公布号 US6836322(B2) 申请公布日期 2004.12.28
申请号 US20020331386 申请日期 2002.12.30
申请人 HYNIX SEMICONDUCTOR INC. 发明人 BAE SANG-MAN
分类号 G01N21/95;G01N21/956;(IPC1-7):G01N21/00 主分类号 G01N21/95
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