发明名称 |
Multi-layer film spectroscopic element for boron fluorescene X-ray analysis |
摘要 |
There is provided a multilayered spectroscopic device effective to achieve in a short length of time the highly accurate fluorescent X-ray analysis of boron wherein the influence that may be brought about by the interfering X-rays and the background is sufficiently reduced and the strength of reflection of B-Kalpha line is sufficient. In this multilayered spectroscopic device 3, lanthanum (La), an alloy containing lanthanum as a principal component or lanthanum oxide (La2O3) is used for the reflecting layers 31 and boron is used for the spacer layers 32 and the periodic length d is chosen to be within the range of 7 to 14 nm and the film thickness ratio of the reflecting layers 31 to the spacer layers 32 is chosen to be within the range of 2/3 to 3/2. It has a total laminated film thickness t of a value sufficient to allow the strength of reflection of B-Kalpha line to be equal to or higher than 98% of a saturation value.
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申请公布号 |
US6836533(B2) |
申请公布日期 |
2004.12.28 |
申请号 |
US20020258845 |
申请日期 |
2002.10.29 |
申请人 |
RIGAKU INDUSTRIAL CORPORATION |
发明人 |
SHIMIZU KAZUAKI |
分类号 |
G01N23/223;G21K1/06;(IPC1-7):G21K1/06 |
主分类号 |
G01N23/223 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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