<p>A semiconductor device (10) comprises an intermediate layer (13) arranged between a semiconductor element (11) and a heatsink (12). The intermediate layer (13) reduces thermal stress which is caused by the heat generated in the semiconductor element (11) due to the thermal expansion gap between the semiconductor element (11) and the heatsink (12). By reducing the thermal stress, warping of the semiconductor device (10) as a whole can be reduced. The intermediate layer (13) is, for example, composed of a carbon-copper composite material.</p>
申请公布号
WO2004112130(A1)
申请公布日期
2004.12.23
申请号
WO2004JP05929
申请日期
2004.04.23
申请人
HONDA MOTOR CO., LTD.;TSUKADA, YOSHINARI;HACHISUKA, KIMIO;YARITA, HIROSHI;TAKANO, FUMITOMO;YAMANAKA, YASURO