| 摘要 |
PURPOSE: A plasma polymerization apparatus is provided to spray uniformly a reaction gas on a sample regardless of the position of the sample by using a plurality of spraying nozzles spaced apart from each other. CONSTITUTION: A plasma polymerization apparatus includes a deposition chamber, a sample supply chamber and a sample retrieve chamber, a power generator, a pair of electrodes, and a gas supply part. The deposition chamber(70) includes an inlet portion(71) and an outlet portion(72). The sample supply chamber(60) is installed at the inlet portion of the deposition chamber to supply continuously samples to the deposition chamber. The sample retrieve chamber(80) is installed at the outlet portion of the deposition chamber to retrieve the samples. The power generator(64) is connected with the sample supply chamber to supply power to the sample. The pair of electrodes(76,77) are installed in the deposition chamber to generate an electric field. The gas supply part is used for supplying uniformly a reaction gas to the entire surface of the sample. The gas supply part includes a gas storing part(74) and a plurality of spraying nozzles(73a,73b,73c) spaced apart from each other between the pair of electrodes and the sample.
|
