| 摘要 |
A bearing arrangement comprises an optical element and a mount which are provided, in particular, for a projection objective in microlithography, the optical element being connected to the mount. The optical element and the mount are connected to one another in such a way that owing to a thermally induced expansion of the optical element and/or of the mount a tilting of the optical element relative to the mount results in it being possible to compensate aberrations which occur.
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