发明名称 Lithographic projection apparatus with collector including concave and convex mirrors
摘要 An optical system includes a radiation source and at least one collector located in the vicinity of the radiation source. The collector is arranged to collect the radiation to provide a beam of radiation. The at least one collector includes a first reflector on a concave surface and a second reflector on a convex surface, the convex surface surrounding the concave surface.
申请公布号 US2004257546(A1) 申请公布日期 2004.12.23
申请号 US20040817969 申请日期 2004.04.06
申请人 ASML NETHERLANDS B.V. 发明人 BANINE VADIM YEVGENYEVICH
分类号 G02B17/06;G03F7/20;H01L21/027;(IPC1-7):G03B27/54 主分类号 G02B17/06
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