| 摘要 |
A dimension measuring method of measuring a dimension of a pattern on a photomask. This method comprises acquiring, using an optical microscope, an image containing the pattern on the photomask, acquiring a simulated image from photomask design data corresponding to the acquired image, and comparing the image with the simulated image based on a determination condition. If the comparison result does not satisfy the determination condition, the operation of acquiring the simulated image and comparing the image acquired by the optical microscope with the simulated image is repeated after a pattern dimension included in the photomask design data is changed, until the comparison result satisfies the determination condition. |
