RF CURRENT RETURN PATH FOR A LARGE AREA SUBSTRATE PLASMA REACTOR
摘要
An apparatus for providing a return current path for RF current between a chamber wall and a substrate support is provided comprising a low impedance flexible curtain having a first end and a second end, the first end adapted to be electrically connected to the chamber wall and the second end adapted to be connected to the substrate support, wherein the curtain further comprises at least one fold in the curtain material, located an axial distance between the first end and the second end, and at least one perforation cut into the curtain proximate the second end.
申请公布号
WO2004112077(A2)
申请公布日期
2004.12.23
申请号
WO2004US17387
申请日期
2004.06.01
申请人
APPLIED MATERIALS, INC.;BLONIGAN, WENDELL;KELLER, ERNST;SORENSEN, CARL