MASK PROCESSING APPARATUS HAVING FOCUS MEMBER WITH ARCH TYPE SIDEWALLS

摘要

PURPOSE: A mask processing apparatus is provided to etch uniformly a thin film on a photo-mask by using a focus member with arch type sidewalls. CONSTITUTION: A mask processing apparatus includes a reaction chamber, a holder, a gas supply member and a focus member. The reaction chamber is used for performing a predetermined process on a mask(100). The holder is installed at a bottom of the chamber to support the mask. The gas supply member(130) is prolonged downward into the chamber to supply a process gas. The focus member(120) surrounds a periphery of the mask in the chamber. The focus member includes a plurality of arch type sidewalls for distributing uniformly the process gas on the mask.