发明名称 |
Exposure apparatus, device manufacturing method, stage apparatus, and alignment method |
摘要 |
An exposure apparatus for exposing a substrate to a pattern due to an original includes a substrate stage which holds and moves the substrate, and a first measurement unit which is arranged on the substrate stage, and measures a position of a mark formed on the original by projecting and receiving light.
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申请公布号 |
US2004257550(A1) |
申请公布日期 |
2004.12.23 |
申请号 |
US20040864474 |
申请日期 |
2004.06.10 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
KASUMI KAZUYUKI |
分类号 |
G03B27/42;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03B27/42 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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