发明名称 Exposure apparatus, device manufacturing method, stage apparatus, and alignment method
摘要 An exposure apparatus for exposing a substrate to a pattern due to an original includes a substrate stage which holds and moves the substrate, and a first measurement unit which is arranged on the substrate stage, and measures a position of a mark formed on the original by projecting and receiving light.
申请公布号 US2004257550(A1) 申请公布日期 2004.12.23
申请号 US20040864474 申请日期 2004.06.10
申请人 CANON KABUSHIKI KAISHA 发明人 KASUMI KAZUYUKI
分类号 G03B27/42;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03B27/42 主分类号 G03B27/42
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