发明名称 DRAM memory storing charge at high density, has insulated nanotubes contacting electrode layer, with intervening filler in capacitor-forming configuration
摘要 <p>The memory includes tubes (301) on the electrode layer (202) and in contact with it. A dielectric coating (302) covers them. Filler (403) intervenes in the spaces between them, and is connected to an opposite electrode (402). The configuration forms an electrical capacitor between the electrode layer and the opposite electrode, for charge storage. An independent claim is included for the method of manufacture.</p>
申请公布号 DE10324081(A1) 申请公布日期 2004.12.23
申请号 DE2003124081 申请日期 2003.05.27
申请人 INFINEON TECHNOLOGIES AG 发明人 REISINGER, HANS;STENGL, REINHARD;SCHAEFER, HERBERT
分类号 G11C13/02;H01L21/02;H01L21/8242;H01L27/108;H01L51/00;H01L51/30;(IPC1-7):G11C11/21;G11C19/00;H01L21/824;H01L21/762 主分类号 G11C13/02
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