发明名称 ELECTROSTATIC DEFLECTION SYSTEM AND DISPLAY DEVICE
摘要 <p>The invention relates to an electrostatic deflection system for deflecting an electron beam (132), and to a matrix display device provided with such an electrostatic deflection system. The deflection system has deflectors (112, 114) for the horizontal and vertical directions, and a focus electrode (110). By applying a sufficiently high voltage difference of for example several kiloVolts between the focus electrode (110) and at least one of the deflectors (112, 114), a bipotential type focusing electron lens is integrated with the deflection system. Thereby, the system achieves simultaneous deflection of the electron beam (132) and focusing of the electron beam onto a surface (140) to be scanned. In a matrix display device, the electron beam (332) may be kept in focus on the display screen (340) thereby obtaining a relatively small spot size and high image quality. Generally, the display screens divided into a number of portions (344). In operation, each portion is scanned by a separate electron beam (332).</p>
申请公布号 WO2004112076(A1) 申请公布日期 2004.12.23
申请号 WO2004IB50816 申请日期 2004.06.01
申请人 KONINKLIJKE PHILIPS ELECTRONICS N.V.;VISSENBERG, MICHEL, C., J., M.;VAN ABEELEN, FRANK, A.;CORTENRAAD, HUBERTUS, M., R.;HOLTSLAG, ANTONIUS, H., M. 发明人 VISSENBERG, MICHEL, C., J., M.;VAN ABEELEN, FRANK, A.;CORTENRAAD, HUBERTUS, M., R.;HOLTSLAG, ANTONIUS, H., M.
分类号 H01J29/74;H01J31/12;(IPC1-7):H01J31/12 主分类号 H01J29/74
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