| 发明名称 |
PHOTOCURABLE RESIN COMPOSITION |
| 摘要 |
<p>The invention relates to a radiation curable composition comprising (A) a component comprising a carboxyl group that may dissociate in the presence of an acid, (B) a cationically polymerizable compound, and (C) a cationic photoinitiator.</p> |
| 申请公布号 |
WO2004111733(A1) |
申请公布日期 |
2004.12.23 |
| 申请号 |
WO2004NL00423 |
申请日期 |
2004.06.14 |
| 申请人 |
DSM IP ASSETS B.V.;YASHIRO, TAKAO;TATARA, RYOJI;TANABE, TAKAYOSHI |
发明人 |
YASHIRO, TAKAO;TATARA, RYOJI;TANABE, TAKAYOSHI |
| 分类号 |
C08L21/00;C08G59/40;C08L63/00;G03F7/00;G03F7/027;G03F7/038;(IPC1-7):G03F7/038 |
主分类号 |
C08L21/00 |
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