REMOVER LIQUID AND REMOVING METHOD FOR ANTIREFLECTIVE FILM AND BURIED MATERIAL CONTAINING SILICON
摘要
<p>A remover liquid for removing an antireflective film and a buried material containing silicon is disclosed which contains at least one material selected from the group consisting of organic acids and organic solvents, and a hydrogen fluoride (HF). Also disclosed is a method for removing an antireflective film and/or a buried material containing silicon using such a remover liquid.</p>
