ILLUMINATION DEVICE FOR A MICROLITHOGRAPHIC PROJECTION-EXPOSURE SYSTEM

摘要

The invention relates to an illumination device for a microlithographic projection-exposure system, which preferably operates with a mercury high-pressure lamp as the primary light source. One embodiment of said device comprises an integrator unit for mixing the light of the primary light source, said unit having at least one cuboid integrator rod with a rectangular entrance surface (43) and lateral faces (45, 47) that are aligned at right angles to one another. A cuboid premixing unit (50) with a rectangular cross-section is situated in the optical path, upstream of the entry surface (43), said unit having several reflection surfaces (156, 157, 158, 159) running obliquely in relation to the lateral faces of the integrator rod. The oblique reflection surfaces cause azimuthal mixing of the light and can be used to provide a pupil of illumination light that is largely devoid of ellipticity.