APPARATUS AND METHOD FOR ELECTROCHEMICALLY PROCESSING A MICROELECTRONIC WORKPIECE

摘要

A method and apparatus for electrochemically processing a microelectronic workpiece. The apparatus can include one or more walls defining a processing space configured to contain a processing fluid. The processing space can include at least a first fluid flow region and a second fluid flow region. A first electrode can be disposed in the processing fluid of the first fluid flow region while a second electrode can be coupled to a portion of the microelectronic workpiece, and can be disposed in the processing fluid of the second fluid flow region. Fluid flow within the first fluid flow region can be directed generally toward the first electrode and away from the second electrode while fluid flow within the second fluid flow region can be directed generally toward the second electrode and away from the first electrode. The first electrode may include either an anode or a cathode. A third electrode can be positioned external to the processing space to clean the second electrode and/or control the electrochemical process.