Immersion photolithography system comprising microchannel nozzles

摘要

A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system (100) that focuses the electromagnetic radiation on the substrate (101). A liquid supply system provides liquid flow between the projection optical system (100) and the substrate (101). An optional plurality of micronozzles (416) are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution (107) of the liquid flow in an area where the substrate is being exposed.