发明名称 INSPECTING APPARATUS
摘要 <p>PURPOSE:To improve the accuracy in visually in identifying a defect by independently providing a first optical system for detecting the presence or absence of the defect, and a second optical system for visually identifying the defect of an element to be inspected, detected by the first system. CONSTITUTION:A first optical system for detecting a defect of an element 6 to be inspected by detecting a transmitted light and a second optical system 12 having an objective lens 12a of larger magnification than the objective lens 7a of the first system 6, an eyepiece 12c, an illumination light source 12e and a transmitting illumination light source 12g for visually identifying the type of the defect of the element 6 detected by the first system 7 are independently provided. Accordingly, the type of the defect of the element 6 of the system 12 can be accurately identified in relatively high magnification without limiting the magnification of the system 7. Thus, the accuracy of the identifying work due to the visual observation of the defect of the element 6 can be improved.</p>
申请公布号 JPS6352433(A) 申请公布日期 1988.03.05
申请号 JP19860195336 申请日期 1986.08.22
申请人 HITACHI LTD 发明人 KOIZUMI YASUHIRO
分类号 G03F1/00;G03F1/84;H01L21/66 主分类号 G03F1/00
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