| 摘要 |
PURPOSE:To obtain a device, on which a reduction projection lens having high resolving power is loaded and which can transfer an element pattern having a large area by using one photo-mask, by installing a reticule stage, to which a reticule having a large area can be mounted and can be positioned at an arbitrary position. CONSTITUTION:A reticule stage 5, on which a reticule 3 having a region larger than a transferable region in a reduction projection lens 6 can be loaded, and a means positioning the reticule stage 5 so as to be able to position the predetermined regions for patterns drawn on the reticule 3 into the transferable region are provided. A pattern such as an element pattern 4 having an area larger than the projectable area of a reduction projection exposure device is divided into plural sections and drawn onto the reticule 3, and reticule alignment marks 4-5 are formed in response to each divided pattern 4-1-4-4. The patterns 4-1-4-4 are positioned respectively into an exposure region, and transferred gradually in succession, thus transferring the element pattern having a large area. |
