发明名称 |
Flerskiktsstruktur och förfarande för dess framställning |
摘要 |
<p>The invention relates to a multilayer material deposited by ALD. A multi-layer structure of a high refractive index material is deposited on a substrate using ALD at a temperature below about 450 °C. Advantageous results are obtained when a high refractive index material A is coated with another material B after a certain thickness of material A has been achieved. Thus, the B barrier layer stops the tendency for material A to crystallize. The amorphous structure gives rise to less optical loss. Further, the different stress nature of materials A and B may be utilized to achieve a final optical material with minimal stress. The thickness of each material B layer is less than that of the adjacent A layer(s). The total effective refractive index of the high refractive index material A+B being shall be greater than 2.20 at a wavelength of 600 nm. Titanium oxide and aluminium oxide are preferred A and B materials. The structure is useful for optical coatings.</p> |
申请公布号 |
FI20045495(A0) |
申请公布日期 |
2004.12.21 |
申请号 |
FI20040005495 |
申请日期 |
2004.12.21 |
申请人 |
PLANAR, |
发明人 |
MAULA,JARMO;HAERKOENEN,KARI;NIKOLOV,ANGUEL |
分类号 |
C23C16/40;C23C16/455;G02B;G02B1/10;H01L21/314;(IPC1-7):G02B |
主分类号 |
C23C16/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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