发明名称 Supplying and exhausting system in plasma polymerizing apparatus
摘要 A plasma polymerizing apparatus is provided which comprises at least one chamber in which sheet to be coated can be moved continuously, at least one gas inlet supplying reactive gas into the chamber, and at least one gas outlet exhausting the reactive gas out of the chamber, wherein the gas inlet and the gas outlet are disposed on the chamber in such a way that reactive gas flows in substantially parallel with moving direction of the sheet.
申请公布号 US6833120(B2) 申请公布日期 2004.12.21
申请号 US20020220778 申请日期 2002.12.09
申请人 LG ELECTRONICS INC. 发明人 JEONG YOUNG-MAN;LEE SU-WON;YOUN DONG-SIK
分类号 B05D3/04;B05D7/24;C08F2/46;C23C16/44;C23C16/455;C23C16/54;(IPC1-7):B01J19/08 主分类号 B05D3/04
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