| 摘要 |
Architecture and method to transfer data in generation, display or printing high edge placement accuracy images from multiple exposure of plurality of predefined patterns with lower edge placement accuracy. A pattern is laid out on a grid finer or different from grid size of image transducer pixel size, overlaid by transducer grid and converted to n patterns compatible with transducer grid. When combined by partial exposures weighting patterns unevenly, the n patterns generate an image with line edge positions a fraction (1/(2<n>-1)) of transducer grid size. For most picture display and step-and-repeat lithography applications, pattern stored in first memory is displayed or partially exposed once, and remaining patterns are displayed or partially exposed 2<m-1 >times m being copy number of the pattern. Superimposing 2<n>-1 exposures in human eye to scene integration time, picture with improved line placement accuracy is perceived.
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