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发明名称
用于制造高折射率光学层的蒸气沈积材料
摘要
本发明系关于一种用于制造高折射率光学层之蒸气沉积材料,其包括莫耳比为从4:1至1:4之氧化钛和氧化镱;及有关彼之制造方法,与彼之用途。
申请公布号
TW200427645
申请公布日期
2004.12.16
申请号
TW093103639
申请日期
2004.02.16
申请人
麦克专利有限公司
发明人
马丁 佛瑞兹;雷纳 多布罗斯基;伍威 安乐斯
分类号
C03C17/245
主分类号
C03C17/245
代理机构
代理人
林志刚
主权项
地址
德国
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