| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce the side-etching quantity of a film on a metal reflection film and to prevent the film from peeling in partially etching the metal reflection film. <P>SOLUTION: In a light reflective substrate having at least one layer or more of a refractive index adjusting layers 20 comprising a hard-to-etch film 13 consisting of a low refractive index transparent film, and an indium oxide-based film 14 consisting of a high refractive index transparent film, laminated in this order on the metal reflection film 12, thickness of the hard-to-etch film 13 is made to be 15 nm or less. A transflective film is formed by etching the metal reflection film 12 together with the refractive index adjusting layer 20. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
