METHOD FOR PRODUCING HOLLOW VESSEL PROVIDED WITH CERAMIC THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a hollow vessel provided with a ceramic thin film having a sufficient performance independent of the shape and size of the hollow vessel. SOLUTION: The hollow vessel provided with a ceramic thin film is produced by applying a ceramic thin film to the surface of a hollow vessel by plasma CVD method. The film-forming process is carried out under a pressure different from the plasma generation pressure. Especially, the control of the plasma generation pressure is carried out by adjusting the flow rate of the raw material gas. COPYRIGHT: (C)2005,JPO&NCIPI