| 摘要 |
PROBLEM TO BE SOLVED: To provide an illumination system which stabilizes the variations in the dose of pulse-to-pulse in maskless lithography. SOLUTION: The illumination system 102 is composed of a light source 600 connected with a control device 604, a non-linear attenuator 606, and an adjustment system 602 including an attenuator 608 adjustable according to a need. and the non-linear attenuator 606 can operates, while in operation as an optical saturator which forms an effective output pulse energy profile of each laser pulse constant. COPYRIGHT: (C)2005,JPO&NCIPI
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