DEPOSITED FILM FORMATION DEVICE, AND DEPOSITED FILM FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a deposited film formation device and a deposited film formation method for making remarkable reduction of abnormal growth, enhancement of quality and cost reduction compatible with each other in high dimensions. SOLUTION: The deposited film formation device is provided with: a reaction vessel which has a cylindrical substrate disposed and which can be evacuated; an exhaust means; a gas feed means; and a high frequency power source. A substrate holder for installing the cylindrical substrate consists of a metallic cylinder. A part thereof is provided with a projecting part of a dielectric substance having a diameter larger than that of the cylindrical substrate. The projecting part is a part of a cone in which the diameter of the part far from the cylindrical substrate is larger and the diameter of the part closer to the cylindrical substrate is almost the same as that of the cylindrical substrate. COPYRIGHT: (C)2005,JPO&NCIPI