| 发明名称 |
IMPROVED BELLOWS SHIELD IN A PLASMA PROCESSING SYSTEM,AND METHOD OF MANUFACTURE OF SUCH BELLOWS SHIELD |
| 摘要 |
The present invention presents an improved bellows shield(54) for a plasma processing system(1), wherein the design and fabrication of the bellows shield coupled to a substrate holder electrode(30) advantageously provides protection of a bellows(52) with substantially minimal erosion of the bellows shield. |
| 申请公布号 |
WO2004030012(A3) |
申请公布日期 |
2004.12.16 |
| 申请号 |
WO2003IB04667 |
申请日期 |
2003.09.29 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
SAIGUSA, HIDEHITO;TAKASE, TAIRA;MITSUHASHI, KOUJI;NAKAYAMA, HIROYUKI |
| 分类号 |
H01J37/00;H01J37/02;H01J37/32;H01L21/00;H01L21/306 |
主分类号 |
H01J37/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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