Production of an electrical contact in an integrated circuit comprises applying and structuring a hard mask layer on an insulating layer to form regions for contact hole openings in the insulating layer, and further processing

摘要

Production of an electrical contact in an integrated circuit comprises applying and structuring a hard mask layer (8) on an insulating layer (6,7) to form regions for contact hole openings in the insulating layer to contact the components formed in a silicon wafer (1) for subsequent anisotropic etching, and completely removing the hard mask layer from the insulating layer after inserting a filler layer (10) in the contact hole openings.