| 摘要 |
PURPOSE:To prevent a substrate from being electrified during a drawing operation of a phase-shift pattern by a method wherein, when the phase-shift pattern is exposed by using an electron beam, a process provided with an electrification- preventing means is used. CONSTITUTION:A light-shielding film 2 composed of Cr is formed on a glass substrate 1. Then, an original-picture pattern composed of transmission parts 2-1 to 2-3 and an alignment target pattern 2-4 are formed simultaneously. Then, a phase-shift layer 3 is applied to the whole surface. Then, a resist 4 is applied to the whole surface; then, the layer 4 and the layer 3 are removed only in an alignment target part 5. After that, the substrate 1 is etched by making use of a Cr film of the pattern 2-4 as a mask; a U-shaped alignment target pattern 6 is formed. Then, the resist 4 is removed; an electron-beam resist 7 is applied to the whole surface; an Al film 8 for electrification-preventing use is formed on it. After that, a phase-shift pattern is drawn by using an electron beam 9. Then, the film 8 is removed; a developing operation is executed; a resist pattern 4' is formed. |
