| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a transparent gas-barrier laminated film for electronics elements which is improved in gas-barrier properties without deteriorating the transparency of a plastic film and is excellent in post processing aptitude. <P>SOLUTION: In the transparent gas-barrier film, a silicon oxide layer of a high degree of oxidation the value of x of SiOx of which is at least 1.8 is formed at least on one side of a substrate of a plastic film by a dry coating method, and a silicon oxide layer of a low degree of oxidation the value of x of SiOx of which is 1.0-1.6 is formed on the silicon oxide layer of the high degree of oxidation. After plasma treatment by a gas comprising at least one of oxygen, nitrogen, argon, or helium is applied to the surface of the silicon oxide layer of the low degree of oxidation, a polymer layer is laminated on the plasma-treated surface of the silicon oxide of the low degree of oxidation. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
