| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To prevent the generation of secondary contamination such as particles, damage or the like during mask washing. <P>SOLUTION: The storing vessel 2 for the pattern transfer mask is provided with a vessel body 10; a mask holding unit 20 installed in the vessel body 10 to hold the mask 1; and a light transmitting unit 30 provided in a predetermined region of the vessel body 10, which is opposed to the mask 1 held by the mask holding unit 20 to transmit a predetermined external light for cleaning the mask 1 held by the mask holding unit 20 by irradiating the same, while the mask 1 is cleaned by transmitting a predetermined external light through the light transmitting unit 30. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
