发明名称 SOUND DETECTION MECHANISM AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a sound detection mechanism wherein distortion in a diaphragm is suppressed while forming the diaphragm with a required thickness. SOLUTION: A silicon nitride film 303 is formed on a film face of a silicon oxide film 302 formed on a support substrate A as a stress relaxation layer, a polycrystal silicon film 304 is formed on a film face of the silicon nitride film 303, part of the polycrystal silicon film 304 acts like the diaphragm B, and a back electrode C comprising the polycrystal silicon film 304 is formed on the film face of the polycrystal silicon film 304 via a spacer C comprising a sacrificial layer. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004356708(A) 申请公布日期 2004.12.16
申请号 JP20030148919 申请日期 2003.05.27
申请人 HOSIDEN CORP;TOKYO ELECTRON LTD 发明人 KOMAI MASATSUGU;KAGAWA KENICHI;OBAYASHI YOSHIAKI;YASUDA MAMORU;SAEKI SHINICHI
分类号 H01L29/84;H04R19/00;H04R19/01;(IPC1-7):H04R19/01 主分类号 H01L29/84
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