发明名称 |
SOUND DETECTION MECHANISM AND MANUFACTURING METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To provide a sound detection mechanism wherein distortion in a diaphragm is suppressed while forming the diaphragm with a required thickness. SOLUTION: A silicon nitride film 303 is formed on a film face of a silicon oxide film 302 formed on a support substrate A as a stress relaxation layer, a polycrystal silicon film 304 is formed on a film face of the silicon nitride film 303, part of the polycrystal silicon film 304 acts like the diaphragm B, and a back electrode C comprising the polycrystal silicon film 304 is formed on the film face of the polycrystal silicon film 304 via a spacer C comprising a sacrificial layer. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004356708(A) |
申请公布日期 |
2004.12.16 |
申请号 |
JP20030148919 |
申请日期 |
2003.05.27 |
申请人 |
HOSIDEN CORP;TOKYO ELECTRON LTD |
发明人 |
KOMAI MASATSUGU;KAGAWA KENICHI;OBAYASHI YOSHIAKI;YASUDA MAMORU;SAEKI SHINICHI |
分类号 |
H01L29/84;H04R19/00;H04R19/01;(IPC1-7):H04R19/01 |
主分类号 |
H01L29/84 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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