发明名称 PELLICLE FOR MASK
摘要 <p><P>PROBLEM TO BE SOLVED: To make easily replacable inert gas in a corner part of a pellicle frame and to make efficiently replacable inert gas in the pellicle in a short time. <P>SOLUTION: A pellicle plate is adhered to the upper end face of a square pellicle frame, and the pellicle frame is provided with an aeration part near each of four corners to connect the inside and the outside of the pellicle. The aeration part is preferably an aeration hole formed in the pellicle frame or is preferably a notch formed in the pellicle frame. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2004354720(A) 申请公布日期 2004.12.16
申请号 JP20030152629 申请日期 2003.05.29
申请人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC 发明人 TANAKA YOSHIYUKI;TANAKA KEIJI
分类号 G03F1/62;G03F1/64;(IPC1-7):G03F1/14 主分类号 G03F1/62
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