| 摘要 |
PROBLEM TO BE SOLVED: To provide a scanning exposure system of the structure that a wafer can be accurately, easily aligned, and a gas is hardly introduced between a lens and the wafer. SOLUTION: A lower side surface of a convex lens 200 of a reduction projection optical system 3 becomes parallel to the wafer 4 and flat only at a central part (a width of about 10 mm) and its left and right become oblique surfaces when a cross section is taken in a predetermined direction. Meanwhile, when the cross section is taken in a direction crossing the predetermined direction, the lower side surface of the convex lens 200 becomes flat in the entirety. When a liquid immersion optical system is applied to the scanning exposure system of this convex lens, the structure that the wafer can be accurately aligned and the gas is hardly introduced between the lens and the wafer is obtained in the scanning exposure system. COPYRIGHT: (C)2005,JPO&NCIPI
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