| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming inorganic coated film and an apparatus therefor capable of realizing an inorganic coated film having excellent durability and a low cost and dispensing with the conventional wax and polymer processing. SOLUTION: The apparatus for forming inorganic coated film comprises a charged water production vessel 1, a magnetic field treatment vessel 2 and a coated film forming vessel 3. The charged water production vessel 1 is provided with a raw water supply port 11, a charged water b taking-out port 12 and a ceramic particle charged part 13 into which the innumerable ceramic particles 14 including at least silicon and aluminum as eluting components therein are charged. The magnetic treatment vessel 2 is provided with a charged water feeding port 21 and a magnetic field treated water c taking-out port 22. Therein, an S pole 23a and an N pole 23b for forming an electromagnetic field are arranged and a water passage 24 of the charged water b is disposed between the poles. The coated film forming vessel 3 is provided with a magnetic field treated water c feeding port 31 and a treated waste water d taking-out port 32 and is provided with a nozzle 34 which sprays compressed magnetic field treated water c to the surface of a work 33 arranged in the vessel. COPYRIGHT: (C)2005,JPO&NCIPI
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