MASKLESS LITHOGRAPHY SYSTEM FOR FORMING GRAY SCALE PATTERN ON OBJECT AND METHOD FOR FORMING GRAY SCALE PATTERN ON OBJECT BETWEEN MASKLESS LITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a better gray scale pattern by using relatively less pulses (for example, 2 to 4 pulses) at each feature. SOLUTION: An exposure light pattern having spatially changeable intensity is formed by illuminating light on an array of a spatial light modulator and patterning the light with SLM, the patterned light is written on the object and the gray-scaled pattern is formed on the object based on the above-mentioned spatially changeable intensity. COPYRIGHT: (C)2005,JPO&NCIPI