发明名称 EVALUATION METHOD OF RESIST SENSITIVITY, AND METHOD OF MANUFACTURING RESIST
摘要 PROBLEM TO BE SOLVED: To provide an evaluation method of resist sensitivity with high accuracy. SOLUTION: The method includes steps of: exposing the objective resist film to be inspected to form a monitor mark for exposure light quantity with the light quantity for the inspection by using an exposure apparatus; measuring the characteristic quantity for the inspection varying depending on the exposure light quantity from the transferred image for the inspection of the monitor mark for the exposure light quantity which is transferred onto the objective resist film; and calculating the resist sensitivity for the inspection of the objective resist film from the characteristic quantity for the inspection by using sensitivity correction data. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004354906(A) 申请公布日期 2004.12.16
申请号 JP20030155262 申请日期 2003.05.30
申请人 TOSHIBA CORP 发明人 SHIOBARA HIDESHI;HAYAZAKI KEI;FUJISAWA TADAHITO;ITO SHINICHI
分类号 G03F7/26;G03F7/00;G03F7/039;G03F7/20;H01L21/027;H01L21/47;(IPC1-7):G03F7/26 主分类号 G03F7/26
代理机构 代理人
主权项
地址