| 摘要 |
PROBLEM TO BE SOLVED: To provide a position detection device capable of detecting stably and highly accurately the surface position of a mask protected by a pellicle film, while suppressing the influence of a reflectivity spectral characteristic of the pellicle film. SOLUTION: This position detection device for detecting the surface position of a substrate M covered by a thin film PR at an interval is equipped with an irradiation system 1-11 for irradiating the substrate surface with a detection luminous flux from across, and a detection system 12-15 for detecting photoelectrically the detection luminous flux reflected by the substrate surface and detecting the surface position of the substrate based on a photoelectric output. In the irradiation system, the substrate surface is irradiated with the detection luminous flux having a spectral characteristic corresponding to the reflectivity spectral characteristic of the thin film in order to suppress the influence caused by the thin film. COPYRIGHT: (C)2005,JPO&NCIPI
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