Cathode sputtering process comprises preparing components of a reactive gas mixture, controlling gas flows from the reservoirs, forming a reactive gas mixture, removing part of the mixture, and feeding to a vacuum chamber

摘要

Cathode sputtering process comprises preparing at least two components of a reactive gas mixture from different gas reservoirs, controlling gas flows from the reservoirs, combining the controlled gas flows to form a reactive gas mixture in a mixing gas vessel, removing at least 10 % of the reactive gas mixture using a pump, and feeding to a vacuum chamber.