PLASMA TREATMENT APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus capable of a stabilized and continuous treatment with the maintenance period extended.

SOLUTION: The plasma treatment apparatus has a specimen mount 101 provided with a vacuum treatment container 1 with process gas introducing and evacuating means, a shield electrode 14 formed on the peripheral wall side of the vacuum treatment container 1, and an antenna electrode 51 for radiating a high-frequency power into the vacuum treatment container 1. A first high-frequency power is supplied to the antenna electrode 51, and a high-frequency power lower in frequency than the first high-frequency power is supplied to the antenna electrode 51 and a shield electrode 15.

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