发明名称 SUBSTRATE INSPECTION APPARATUS, SUBSTRATE INSPECTION METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a substrate inspection apparatus for acquiring a detection image having an improved contrast without any distortion. <P>SOLUTION: A substrate inspection system 1 comprises a primary optical system 10 for generating electron beams for irradiating the substrate S as primary beams Bp; an electron detection section 30 that detects secondary electrons, or the like, generated from the substrate S by receiving irradiation with the primary beams Bp, and outputs a one-dimensional or two-dimensional image signal on the surface of the substrate S; and a two-dimensional optical system 20 for forming an image at the electron detection section 30 with secondary electrons, or the like, generated from the substrate S as secondary beams 18s. In the substrate inspection system 1, a laser beam irradiator 70 for irradiating a part wherein the secondary beams 18s on the surface of the substrate S are generated with the laser beams L is further provided. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2004354084(A) 申请公布日期 2004.12.16
申请号 JP20030149172 申请日期 2003.05.27
申请人 TOSHIBA CORP 发明人 NAGAHAMA ICHIROTA;YAMAZAKI YUICHIRO;NAGAI TAKAMITSU;MIYOSHI MOTOSUKE
分类号 G01N23/203;G01N23/225;G01R31/302;H01L21/66;(IPC1-7):G01R31/302 主分类号 G01N23/203
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