| 摘要 |
PROBLEM TO BE SOLVED: To solve a problem wherein a film thickness control method when preparing an NBPF is different from an evaluation method after the NBPF is prepared, in a conventional NBPF manufacturing process. SOLUTION: Spectroscopic characteristics in various film thicknesses of respective layers are calculated preliminarily as theoretical values on the basis of a film design for obtaining a desired optical characteristic, measuring light projected to a film formation substrate is wavelength-swept to compare in order the theoretical values with an observed value of the spectroscopic characteristic in the film formation, in order to control the film thickness, and the spectroscopic characteristic of the film formation substrate is observed thereby. Actually, this method/device of the present invention is provided with a spectroscopic characteristic measuring photoreceiver for receiving the light transmitted or reflected through/by the film formation substrate, and for photoelectric-transferring the received light to be output, while synchronized with wavelength sweeping of a wavelength variable laser for wavelength-sweeping the measuring light projected to the film formation substrate, and a light power meter for measuring a transmittance or reflectance of the film formation substrate to be output, while synchronized with an output from the spectroscopic characteristic measuring photoreceiver, and the spectroscopic characteristic of the film formation substrate is read in on the basis of the transmittance or reflectance output from the light power meter to be compared with the theoretical values. The method/device includes a technique for selecting alternatively a monochromic measuring method or a spectroscopic characteristic method. COPYRIGHT: (C)2005,JPO&NCIPI
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