| 发明名称 |
Method of forming a pattern of sub-micron broad features |
| 摘要 |
A pattern of very fine features (18) can be produced by illuminating an inorganic negative tone resist layer (16), provided on an electroplating base layer (14), by a beam (EB), which is able to cure the resist to a cured pattern according to the pattern to be formed, removing the non-illuminated portions of the resist layer and electroplating a layer (20) between the cured portions (18) of the resist layer.
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| 申请公布号 |
US2004255305(A1) |
申请公布日期 |
2004.12.16 |
| 申请号 |
US20040493176 |
申请日期 |
2004.04.20 |
| 申请人 |
VAN DOREN EGIDIUS GERARDUS PETRUS;VAN HEESCH HENDRIKUS CHRISTIANUS WILHEMUS |
发明人 |
VAN DOREN EGIDIUS GERARDUS PETRUS;VAN HEESCH HENDRIKUS CHRISTIANUS WILHEMUS |
| 分类号 |
G03F1/16;G03F7/00;G03F7/075;G03F7/11;G03F7/20;G03F7/40;G11B5/31;H01L21/027;H05K3/10;(IPC1-7):G06F9/00 |
主分类号 |
G03F1/16 |
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