| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a thin film by which the uniform thin film can be formed by emitting pulse laser beam onto the broader surface of a target as possible, in a pulse laser beam evaporation depositing method. SOLUTION: This method is the method for forming the thin film, by which the constituted atoms of the target are sputtered by emitting the pulse laser beam onto the surface of the target and the sputtered constituted atoms are deposited on a substrate. The sputtering of the constituted atoms are performed while relatively shifting the emitted point of the pulse laser beam and the target, In this way, this relative shifting is performed by combining a first reciprocating movement and a second reciprocating movement for moving in the different direction and in the different period to the first reciprocating movement. COPYRIGHT: (C)2005,JPO&NCIPI
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