发明名称 Semiconductor wafer including a low dielectric constant thermosetting polymer film and method of making same
摘要 A semiconductor wafer provided with a thermosetting porous insulating film, wherein the insulating film is made porous, cured and polymerized on the wafer. The film is characterized by a very low dielectric constant based on its constituency and porosity, the latter property of which is caused by the inclusion of liquid or supercritical carbon dioxide in the polymeric reaction mixture.
申请公布号 US2004253457(A1) 申请公布日期 2004.12.16
申请号 US20040856028 申请日期 2004.05.28
申请人 HICHRI HABIB;MALONE KELLY;MARTIN ARTHUR 发明人 HICHRI HABIB;MALONE KELLY;MARTIN ARTHUR
分类号 C08L71/00;C09J179/08;H01L21/312;(IPC1-7):B32B9/04 主分类号 C08L71/00
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