发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 A photosensitive resin compsn. is prepd. by mixing a naphthoquinone diazide cpd. and a novolac resin with 0.3-5 wt.% cpd. of formula (I) and 0.3-10 wt.% cpd. of formula (II) as an additive for improving a photosensitivity. In the formulas, R1, R2, R3 and R4 each H or halogen; R5 is H or methyl; R6 is H or CH; R7, R8 and R9 are each H, OH, methoxy or sulfoxy. The cpd. (I) is pref. phthalic anhydride or tetrachlorophthalic anhydride, and the cpd. (II) is pref. 7-hydroxycumalin, 6,7-dihydroxycumalin, 5,7-dimethoxycumalin, etc. The compsn. is used for forming a positive image by coating a pre-sensitized aluminium plate.
申请公布号 KR910004909(B1) 申请公布日期 1991.07.15
申请号 KR19880013226 申请日期 1988.10.11
申请人 CHEIL SYNTHETIC IND.CO.,LTD. 发明人 KIM KWANG-TAE;KIM JONG-RAK;KIM DAE-IN;SHIN SONG-HO
分类号 G03F7/022;(IPC1-7):G03F7/022 主分类号 G03F7/022
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