发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device designed for a protection circuit for realizing long life of an Li<SP>+</SP>battery pack and for miniaturization. <P>SOLUTION: Power MOS FETs Q<SB>1</SB>and Q<SB>2</SB>formed in a semiconductor chip 3 to function the protection circuit for the Li<SP>+</SP>battery pack, a source pad, a gate pad, a gate pad, and a source pad are arranged sequentially from one direction. According to the pad arrangement, with respect to lead pins 6b of a lead frame 6; a source pin S<SB>1</SB>, a gate pin G<SB>1</SB>, a gate pin G<SB>2</SB>, and a source pin S<SB>2</SB>are sequentially from one pin. On a wiring pattern 8 on a mounting substrate 5; a source wiring pattern MS<SB>1</SB>, a gate wiring pattern MG<SB>1</SB>, a gate wiring pattern MG<SB>2</SB>, and a source wiring pattern MS<SB>2</SB>are arranged sequentially from one direction as a layout. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004356499(A) 申请公布日期 2004.12.16
申请号 JP20030154307 申请日期 2003.05.30
申请人 RENESAS TECHNOLOGY CORP;SONY CORP 发明人 KATO KOICHI;KOYANO MASAFUMI;NITTA SHIGEAKI
分类号 H01L21/60;H01L23/50;H01M10/42 主分类号 H01L21/60
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