| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithographic projection equipment including a means which selectively penetrates a projection beam, before imaging the pattern-formed beam on a substrate. SOLUTION: The means can include one of the following devices, that is, a selective penetration device, located downstream of a patterning means in a direction of the projection beam, a masking blade which is fixed or is movably set in a scanning system, and an arrayed, exchangeable element. The means can be located in a structure of a mask table, a flame, or the lithographic projection equipment. COPYRIGHT: (C)2005,JPO&NCIPI
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