PLASMA SOURCE AND PLASMA TREATMENT SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a plasma source by which high density plasma can be highly efficiently produced and to provide a plasma treatment system.

SOLUTION: The plasma source is constituted of: a chamber into which gas is supplied; and a hollow cathode electrode member which has a plurality of electrode holes capable of passing gas and is disposed on the gas outlet side of the chamber. In such a plasma source, microcathode plasma discharge can be performed within the electrode holes of the hollow cathode electrode member.

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